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Volume 104
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Growth characteristics of TiO2 films synthesized by fluidized bed atomic layer deposition
Liyuan Zhang, Zuyang Zhang, Daoyin Liu *
Key Laboratory of Energy Thermal Conversion and Control of Ministry of Education, School of Energy and Environment, Southeast University, Nanjing, 210096, China
10.1016/j.partic.2025.05.024
Volume 104, September 2025, Pages 1-16
Received 17 April 2025, Revised 23 May 2025, Accepted 26 May 2025, Available online 9 June 2025, Version of Record 23 June 2025.
E-mail: dyliu@seu.edu.cn
Highlights

• Growth characteristics of FBALD-TiO2 under various conditions are investigated.

• FBALD-TiO2 forms films at 120–180 °C and islands at 240–300 °C.

• TiCl4 achieves higher GPC, whereas TTIP enhances film uniformity.

• FBALD yields more efficient SiO2@TiO2 photocatalyst than solution impregnation.

• Three typical growth modes of FBALD-TiO2 are summarized.


Abstract

TiO2 is an ultra-wide bandgap semiconductor with excellent physical properties and promising applications in photocatalysis and photo-electrocatalysis. Fluidized bed atomic layer deposition (FBALD) is an effective method for depositing TiO2 films, offering precise thickness control. This study presents a comprehensive investigation into the growth characteristics and properties of TiO2 films on SiO2 particles prepared via FBALD, with a focus on the impact of cycle number, temperature, precursor concentration, pulse time, purge time and precursor component. The TEM images indicate that continuous and uniform TiO2 films are formed at 120 °C and 180 °C, whereas dispersed nanoscale TiO2 islands are observed at 240 °C and 300 °C. By increasing precursor supply or reducing N2 purge time, the film growth rate significantly increases. Additionally, increasing the precursor pulse time has a stronger effect on film growth, while decreasing the N2 purge time leads to more uneven film thickness growth. The core-shell structured SiO2@TiO2 photocatalysts synthesized using TiCl4 and TTIP as precursors both exhibit good photocatalytic degradation performance that, under 300 W xenon lamp irradiation for 60 min, the degradation efficiency of tetracycline hydrochloride (TC) reaches 95 % and 90 %, respectively. This performance surpasses that of catalysts prepared by solution impregnation method under the same mass fraction.

Graphical abstract
Keywords
Fluidized bed atomic layer deposition; Nanoscale TiO2 film; Growth characteristics; SiO2@TiO2 photocatalyst
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